Lithography
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PAS 5500™/1150C
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production.
The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90-nm.
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production.
The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90-nm.
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Lithography
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